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High Vacuum Systems-NANO 36
• Thermal evaporator
• Process Chamber Construction: 304L Stainless Steel with 6061 Aluminum
• Magnetron Sputtering Sources: 3
• Thermal Evaporation Sources: 4
• Low Temperature Evaporation Sources (LTE): 4
• Deposition Orientation: Sputter Up, Evaporation Up
• Platen: Heating Up to 350°C / Water-Cooling
• Substrate Size: (max) 100mm x 100mm, 150mm Dia
• Standard Vacuum Pumping: 260 l/sec Turbo Pump
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