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  High Vacuum Systems-NANO 36

  • Thermal evaporator
  • Process Chamber Construction: 304L Stainless Steel with 6061 Aluminum
  • Magnetron Sputtering Sources: 3
  • Thermal Evaporation Sources: 4
  • Low Temperature Evaporation Sources (LTE): 4
  • Deposition Orientation: Sputter Up, Evaporation Up
  • Platen: Heating Up to 350°C / Water-Cooling
  • Substrate Size: (max) 100mm x 100mm, 150mm Dia
  • Standard Vacuum Pumping: 260 l/sec Turbo Pump

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  High Vacuum Systems-PRO Line PVD 75

  • Process Chamber Construction: 304L Stainless Steel
  • Electron Beam Source: Multi Pocket, 5kW or 10kW Power Supplies
  • Thermal Evaporation: Up To Four, 4″ Individual Boats, Or Six 2″ Boat Assemblies
  • Substrate Size: (max) 150mm Dia
  • Standard Vacuum Pumping: Pfeiffer 790 L/s turbo molecular pump & Edwards dry pump
  • Power supplies: DC, PDC, RF, MF, and HIPIMS

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  VPC-061 Vacuum Coater

  VPC-061 Vacuum Coater

  • Ultimate Pressure: 1.3 × 10⁻³ Pa, 6.6 × 10⁻⁴ Pa (LN₂)
  • Evacuation Time: 4.0 × 10⁻³ Pa/20min, 1.3 × 10⁻³ Pa/20min (LN₂)
  • Bell Jar Size: Glass belljar (dia. 150mm × 200mm(H))
  • Substrate Electrode Distance: Max 100mm
  • Evaporation Electrode Structure: 1 point
  • Recommended Substrate Size (Maximum Substrate Size): sq.25mm (sq.50mm)
  • Evaporation Power Supply: 0–10V 50A (Max)
  • Main Pump: Oil diffusion pump (air cooling) 50 L/sec
  • Backing Pump: Oil rotary vacuum pump 20 L/min
  • Liquid Nitrogen Trap: Equipped
  • Automatic Leak Valve: –
  • Control System: Manual control
  • Weight (Body): 38kg
  • Weight (Power Supply): 40kg
  • Overall Dimensions (Body): 434mm(W) × 422mm(D) × 673mm(H)
  • Overall Dimensions (Power Supply): 480mm(W) × 435.3mm(D) × 149mm(H)
  • Power Requirement (Body): Single phase, 50/60Hz, 100V, 0.63kVA
  • Power Supply: Single phase, 50/60Hz, 100V, 0.63kVA

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