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Showing 129–144 of 168 results

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  Model 32

  Model 32 – UV LED Collimated Lightsource

  For demanding applications. Standalone or integrated intoan OAI lithography system

  • Beam size 4” to 12”
  • Wavelengths available: 365nm, 405nm, and 436nm
  • Long life, low cost, energy efficient
  • Optional single level and multilevel tooling modules
  • Matches Model 30 in collimation and functionality

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  Model 6000

  Model 6000 – Fully Automated Mask Aligner for High Volume Production

  • Flexibility to handle wafer sizes 4” (100mm) to 12” (300mm)
  • Highly optimized yields (200 wph in 1st mask mode)
  • Cognix Vision Pro with customized software
  • Automatic Wedge Effect Leveling
  • Unlimited recipe storage
  • Superb process repeatability
  • Cluster tool integration
  • Front and backside alignment
  • Accurate top to bottom auto alignment
  • Optional UV LED upgrade
  • Optional SECS/GEM Interface upgrade

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  Model 6000A

  Model 6000A-MA Integrated Production Systems- Mask Aligner with Mask Changer

  • Includes all the advanced features of the Model 6000
  • Reads and verifies the right mask for process stored in the Model 6000 recipes
  • Remote diagnosis feature
  • Improves thruput in lithography processing
  • Prints multiple structures on the same level of a biochip

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  Model 6020

  Model 6020 – Large Substrate ExposureSystem for RDL Panel Level PKG or Glass Panels

  • 1st level exposure prints mask on substrates
  • Optional Flood Exposure
  • Substrate size 20” x20” with 24”x24” mask inserts
  • Lamp power 8kw
  • Stand alone system or fully integrated into customer’s line
  • Available with robotic handling

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  Model 800E

  Model 800E – Semi-Automated Mask Aligner for Front or Backside Mask Alignment

  • 3-point automatic wafer leveling
  • Windows 10 operating system with unlimited recipe storage
  • Remote diagnostics
  • Motorized joy stick: allows fast mode to target and precise mode for precision alignment
  • One touch from standard view to wide angle view with
  • no resolution loss
  • IR lamp kit available
  • Optional UV LED upgrade

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  OAI 308 UV Meter

  Meter:

  • RoHS2 and CE Compliant
  • Detachable single or dual wavelength probes
  • Auto ranging, digital display
  • Light intensity measured in milliwatts/cm2
  • Accuracy is traceable to NIST
  • High speed port available for data logging
  • Optional data logging software

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  OAI 656 UV Meter

  Meter:

  • Use with Contact/Proximity Aligners
  • Extremely accurate and reliable
  • Easily download measurements
  • Range of up to 2,000 mW/cm2
  • Memory up to 400 measurements
  • ROHS2 and CE compliant

  Probes:

  Probe wavelengths (nm)
  220, 248, 254, 260, 310, 325, 365, 380, 400, 420, 436 and 540
  Multi-layer absorption
  dielectric filters

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  OAI 659 UV Meter

  Meter:

  Can be used with any Wafer Stepper
  • Extremely accurate and reliable
  • Perfect for High Intensity Wafer Steppers
  • Easily download measurements
  • Range of up to 7,500mW/cm2
  • Memory up to 400 measurements
  • ROHS2 and CE compliant

   

  Probes
  • Designed for each individual stepper to fit on the stage of the stepper
  • Probe wavelengths (nm) 365, 400, 420, 436
  • Multi-layer absorption dielectric filters
  • Interchangeable with any OAI Model 659 Meter

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  OAI Model 200

  Model 200 – Tabletop Contact Mask Aligner

  • Flexible with easy change of substrates and masks
  • Substrates can be small with pieces up to 8”
  • High quality printing resolution
  • Available with near, mid, and deep UV

  Options:

  • UV LED Lightsource
  • IR Backside Alignment
  • Nano Imprint Module
  • Vibration Isolation Table

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  OAI UV Meters Calibration

  Calibration of different types of OAI Meters, such as 308 Meter, 306 Meter, 358 meter, 459 Meter, etc.

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  PL-3D-PD

  Premium 3D Lithography PL-3D-PD

  • Lithography Accuracy: 2um / 5um
  • Minimum Print Thickness: 5 um
  • Maximum sample size: 50mm x 50 mm
  • Single exposure area: 3.84mm*2.16mm @ 2um / 9.60mm*5.40mm @ 5 um

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  Poseidon AX Chip Holder

  Poseidon AX Chip Holder

  • Necessary support for E-chips during TEM experiments
  • Dynamic In-situ TEM Experiment
  • Designed for liquid, heating, and electrochemistry experiments
  • Ensures a hermetically sealed environment for experiments in liquid samples

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  Qulee Reactive Gas Monitor

  • Mass Range: 1 to 200 amu
  • Resolution: M/ΔM = 1M (10% peak height)
  • Sensitivity: 1×10⁻³ A/Pa
  • Minimum Detectable Partial Pressure: 1×10⁻¹⁰ Pa
  • Ion Source: Closed ion source with magnetic field
  • Emission Current: 10 μA
  • Bakeout Temperature: Maximum 120°C
  • Pressure Range: 1×10⁻⁶ to 13 kPa
  • Pumping System: Turbo molecular pump (67 L/s for N₂)
  • Power Supply: AC 100V, 15A
  • Weight: 57 kg (pumping system), 38 kg (controller)

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  RDA-281HA

  Multi-Stage Roots Type

  • Pumping Speed: 281 L/min
  • Ultimate Pressure: 8.0 × 10⁻² Pa
  • Motor: Three phase, 200V, 400W
  • Full Load Current: 1.6A
  • Weight: 30 kg
  • Inlet/Outlet Diameter: Rc 1/2
  • Dimensions: 156(W) × 358(L) × 238(H) mm

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  RDA-501HA

  Multi-Stage Roots Type

  • Pumping Speed: 501 L/min
  • Ultimate Pressure: 8.0 × 10⁻² Pa
  • Motor: Three phase, 200V, 600W
  • Full Load Current: 2.4A
  • Weight: 35 kg
  • Inlet/Outlet Diameter: Rc 1/2
  • Dimensions: 162(W) × 358(L) × 238(H) mm

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  Shadow Masks

  Shadow Mask

  • Used for precise sample deposition on E-chips to prevent electrical shorts and contamination
  • Compatible with Poseidon, Atmosphere, and Fusion E-chips.
  • Part Numbers: SHW-MSK-PKG, E-MSK-21A-10 (Narrow Opening), E-MSK-11A-10 (Square Opening)

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