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Showing 129–144 of 168 results
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Model 32
$0.00Add to cartModel 32 – UV LED Collimated Lightsource
For demanding applications. Standalone or integrated intoan OAI lithography system
- Beam size 4” to 12”
- Wavelengths available: 365nm, 405nm, and 436nm
- Long life, low cost, energy efficient
- Optional single level and multilevel tooling modules
- Matches Model 30 in collimation and functionality
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Model 6000
$0.00Add to cartModel 6000 – Fully Automated Mask Aligner for High Volume Production
- Flexibility to handle wafer sizes 4” (100mm) to 12” (300mm)
- Highly optimized yields (200 wph in 1st mask mode)
- Cognix Vision Pro with customized software
- Automatic Wedge Effect Leveling
- Unlimited recipe storage
- Superb process repeatability
- Cluster tool integration
- Front and backside alignment
- Accurate top to bottom auto alignment
- Optional UV LED upgrade
- Optional SECS/GEM Interface upgrade
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Model 6000A
$0.00Add to cartModel 6000A-MA Integrated Production Systems- Mask Aligner with Mask Changer
- Includes all the advanced features of the Model 6000
- Reads and verifies the right mask for process stored in the Model 6000 recipes
- Remote diagnosis feature
- Improves thruput in lithography processing
- Prints multiple structures on the same level of a biochip
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Model 6020
$0.00Add to cartModel 6020 – Large Substrate ExposureSystem for RDL Panel Level PKG or Glass Panels
- 1st level exposure prints mask on substrates
- Optional Flood Exposure
- Substrate size 20” x20” with 24”x24” mask inserts
- Lamp power 8kw
- Stand alone system or fully integrated into customer’s line
- Available with robotic handling
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Model 800E
$0.00Add to cartModel 800E – Semi-Automated Mask Aligner for Front or Backside Mask Alignment
- 3-point automatic wafer leveling
- Windows 10 operating system with unlimited recipe storage
- Remote diagnostics
- Motorized joy stick: allows fast mode to target and precise mode for precision alignment
- One touch from standard view to wide angle view with
- no resolution loss
- IR lamp kit available
- Optional UV LED upgrade
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OAI 308 UV Meter
Read moreMeter:
• RoHS2 and CE Compliant
• Detachable single or dual wavelength probes
• Auto ranging, digital display
• Light intensity measured in milliwatts/cm2
• Accuracy is traceable to NIST
• High speed port available for data logging
• Optional data logging software -
OAI 656 UV Meter
Read moreMeter:
• Use with Contact/Proximity Aligners
• Extremely accurate and reliable
• Easily download measurements
• Range of up to 2,000 mW/cm2
• Memory up to 400 measurements
• ROHS2 and CE compliantProbes:
Probe wavelengths (nm)
220, 248, 254, 260, 310, 325, 365, 380, 400, 420, 436 and 540
Multi-layer absorption
dielectric filters -
OAI 659 UV Meter
Read moreMeter:
Can be used with any Wafer Stepper
• Extremely accurate and reliable
• Perfect for High Intensity Wafer Steppers
• Easily download measurements
• Range of up to 7,500mW/cm2
• Memory up to 400 measurements
• ROHS2 and CE compliantProbes
• Designed for each individual stepper to fit on the stage of the stepper
• Probe wavelengths (nm) 365, 400, 420, 436
• Multi-layer absorption dielectric filters
• Interchangeable with any OAI Model 659 Meter -
OAI Model 200
$0.00Add to cartModel 200 – Tabletop Contact Mask Aligner
- Flexible with easy change of substrates and masks
- Substrates can be small with pieces up to 8”
- High quality printing resolution
- Available with near, mid, and deep UV
Options:
- UV LED Lightsource
- IR Backside Alignment
- Nano Imprint Module
- Vibration Isolation Table
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OAI UV Meters Calibration
Read moreCalibration of different types of OAI Meters, such as 308 Meter, 306 Meter, 358 meter, 459 Meter, etc.
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PL-3D-PD
$0.00Add to cartPremium 3D Lithography PL-3D-PD
• Lithography Accuracy: 2um / 5um
• Minimum Print Thickness: 5 um
• Maximum sample size: 50mm x 50 mm
• Single exposure area: 3.84mm*2.16mm @ 2um / 9.60mm*5.40mm @ 5 um -
Poseidon AX Chip Holder
Read morePoseidon AX Chip Holder
- Necessary support for E-chips during TEM experiments
- Dynamic In-situ TEM Experiment
- Designed for liquid, heating, and electrochemistry experiments
- Ensures a hermetically sealed environment for experiments in liquid samples
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Qulee Reactive Gas Monitor
$0.00Add to cart- Mass Range: 1 to 200 amu
- Resolution: M/ΔM = 1M (10% peak height)
- Sensitivity: 1×10⁻³ A/Pa
- Minimum Detectable Partial Pressure: 1×10⁻¹⁰ Pa
- Ion Source: Closed ion source with magnetic field
- Emission Current: 10 μA
- Bakeout Temperature: Maximum 120°C
- Pressure Range: 1×10⁻⁶ to 13 kPa
- Pumping System: Turbo molecular pump (67 L/s for N₂)
- Power Supply: AC 100V, 15A
- Weight: 57 kg (pumping system), 38 kg (controller)
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Shadow Masks
Read moreShadow Mask
- Used for precise sample deposition on E-chips to prevent electrical shorts and contamination
- Compatible with Poseidon, Atmosphere, and Fusion E-chips.
- Part Numbers: SHW-MSK-PKG, E-MSK-21A-10 (Narrow Opening), E-MSK-11A-10 (Square Opening)
