Category: Equipments
Equipments
Showing 17–32 of 34 results
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Model 2012
$56,700.00Add to cartModel 2012 – 300mm Optical Edge or Flood Exposure System
• Handles 200 or 300mm wafers (8” -12”)
• Has automated foup loading or cassette to cassette handling
• Up to 8kw Collimated Beam Light Source
• Bar code reader and remote diagnostic
• Semi safety compliant
• Windows graphic user interface
• Remote diagnostics -
Model 212
$5,600.00Add to cartModel 212 – Tabletop Mask Aligner for substrates up to 300mm
- Designed for substrates up to 12” (300 x300 mm)
- Precision alignment
- Low cost R&D tool for large area substrates
- Used for pkg, displays and 300mm wafers
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Model 30
$7,800.00Add to cartModel 30 – UV Collimated Lightsource
Standalone or integrated into any mask aligner or exposure system• Available with near, mid, or deep UV- Mercury Arc and Mercury Xenon lamps
- Highly uniform beam at exposure plain
- Low collimation half angle
- Power up to 12.5 kw
- Pictured with optional stand
- Optional Single Level Tooling Module
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Model 32
$7,900.00Add to cartModel 32 – UV LED Collimated Lightsource
For demanding applications. Standalone or integrated intoan OAI lithography system
- Beam size 4” to 12”
- Wavelengths available: 365nm, 405nm, and 436nm
- Long life, low cost, energy efficient
- Optional single level and multilevel tooling modules
- Matches Model 30 in collimation and functionality
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Model 6000
$55,000.00Add to cartModel 6000 – Fully Automated Mask Aligner for High Volume Production
- Flexibility to handle wafer sizes 4” (100mm) to 12” (300mm)
- Highly optimized yields (200 wph in 1st mask mode)
- Cognix Vision Pro with customized software
- Automatic Wedge Effect Leveling
- Unlimited recipe storage
- Superb process repeatability
- Cluster tool integration
- Front and backside alignment
- Accurate top to bottom auto alignment
- Optional UV LED upgrade
- Optional SECS/GEM Interface upgrade
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Model 6000A
$67,350.00Add to cartModel 6000A-MA Integrated Production Systems- Mask Aligner with Mask Changer
- Includes all the advanced features of the Model 6000
- Reads and verifies the right mask for process stored in the Model 6000 recipes
- Remote diagnosis feature
- Improves thruput in lithography processing
- Prints multiple structures on the same level of a biochip
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Model 6020
$56,000.00Add to cartModel 6020 – Large Substrate ExposureSystem for RDL Panel Level PKG or Glass Panels
- 1st level exposure prints mask on substrates
- Optional Flood Exposure
- Substrate size 20” x20” with 24”x24” mask inserts
- Lamp power 8kw
- Stand alone system or fully integrated into customer’s line
- Available with robotic handling
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Model 800E
$87,990.00Add to cartModel 800E – Semi-Automated Mask Aligner for Front or Backside Mask Alignment
- 3-point automatic wafer leveling
- Windows 10 operating system with unlimited recipe storage
- Remote diagnostics
- Motorized joy stick: allows fast mode to target and precise mode for precision alignment
- One touch from standard view to wide angle view with
- no resolution loss
- IR lamp kit available
- Optional UV LED upgrade
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PL-3D-PD
Add to cartPremium 3D Lithography PL-3D-PD
• Lithography Accuracy: 2um / 5um
• Minimum Print Thickness: 5 um
• Maximum sample size: 50mm x 50 mm
• Single exposure area: 3.84mm*2.16mm @ 2um / 9.60mm*5.40mm @ 5 um -
Qulee Reactive Gas Monitor
Add to cart- Mass Range: 1 to 200 amu
- Resolution: M/ΔM = 1M (10% peak height)
- Sensitivity: 1×10⁻³ A/Pa
- Minimum Detectable Partial Pressure: 1×10⁻¹⁰ Pa
- Ion Source: Closed ion source with magnetic field
- Emission Current: 10 μA
- Bakeout Temperature: Maximum 120°C
- Pressure Range: 1×10⁻⁶ to 13 kPa
- Pumping System: Turbo molecular pump (67 L/s for N₂)
- Power Supply: AC 100V, 15A
- Weight: 57 kg (pumping system), 38 kg (controller)
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Single-Zone 1200°C Split Tube Furnace
$899.00Add to cartFeatures 1 Compact, portable and lightweight design. 2 Split furnace chambers for fast and easy tube access. 3 Standard package includes set of stainless-steel vacuum sealing flanges with valves and pressure meter. 4 Microprocessor based self-tuning PID control provides optimum thermal process with minimal overshoot. 5 Multiple atmosphere processes in a single cycle are possible …
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TriSOL Standard Class AAA (TSS)
$6,900.00Add to cart- Delivers highly collimated uniform light output rated 350W- 5,000W
- Available with air mass filters for a wide range of solar spectra
- Used in photobiology, biomedical, solar cell testing, cosmetic testing, and paint and coatings analysis
- Repeatable reliable constant output, & measurement uniformity
- Rotation beam output can be configured in downward, vertical, horizontal or 360 degree rotation
- Meets JIS, IES, and ASTM standards
- Optional pipe adapter for CPV
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TS580
$56,895.00Add to cart- Temperature change rate is fast, -55 0C toThe conversion between+ 1 25 0C is about 1 0 seconds
- Temperature range of-80 0 C to +225 0 C
- Compact and mobile design
- Touch screen operation, human-computer interaction interface
- Fast DUT temperature stabilization time
- Temperature control accuracy ± 1 oc, display accuracy ± 0.1 oc
- Air up to 18 SCFM
- Defrosting design, rapid removal of internal water vapor accumulation
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UV Litho S+
$5,622.00Add to cart- Minimum Line width: 0.5 um
- Minimum Feature size: 0.35 um
- Writing Speed: 300 mm2/min @ 0.5 um
- 3,000mm2/min @ 5.0 um
- Light source: LD 405nm / 375nm
- XY distance: 55mm
- Overlay Accuracy: 200nm
- Minimum sample size: 1 inch x 1 inch
- Maximum sample size: 8 inch x 8 inch
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UV-Litho-ACA
$550.00Add to cart- Minimum Line width: 1.0um
- Minimum Feature size: 0.8 um
- Writing Speed: 3 mm2/min @ 1um
- 20mm2/min @ 1.5um
- Light source: LED 405nm / 385nm
- XY distance: 55mm
- Overlay Accuracy: 350nm
- minimum sample size: 3mm x 3mm
- Maximum sample size: 150mm x 150 mm
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UV-Litho-S
$3,600.00Add to cart- Minimum Line width: 1.0 um
- Minimum Feature size: 0.8 um
- Writing Speed: 1,200 mm2/min @ 1.0 um
- 3,000mm2/min @ 5.0 um
- Light source: LD 405nm / 375nm
- XY distance: 55mm
- Overlay Accuracy: 200nm
- Minimum sample size: 1 inch x 1 inch
- Maximum sample size: 8 inch x 8 inch
