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Showing 129–144 of 173 results
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MBS-053
Add to cartMechanical Booster Pump
- Pumping Speed: 530 L/min
- Ultimate Pressure: 1.0 × 10⁻³ Pa
- Motor: Three-phase, 200V, 1.5kW
- Full Load Current: 5.3A
- Weight: 58.0 kg
- Inlet/Outlet Diameter: KF-40
- Dimensions: 300(W) × 600(L) × 450(H) mm
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Microwell E-chips
Add to cartMicrowell E-chips
- Microwell Dimensions Small: Membrane thickness: 30 nm, Microwell depth: 170 nm
Large: Membrane thickness: 30 nm, Microwell depth: 170 nm - Models: Poseidon AX Small/Large Microwell E-chips, Triton AX Small/Large Microwell E-chips.
- Microwell Dimensions Small: Membrane thickness: 30 nm, Microwell depth: 170 nm
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Model 200
$6,800.00Add to cartModel 200 – Tabletop Contact Mask Aligner
- Flexible with easy change of substrates and masks
- Substrates can be small with pieces up to 8”
- High quality printing resolution
- Available with near, mid, and deep UV
Options:
- UV LED Lightsource
- IR Backside Alignment
- Nano Imprint Module
- Vibration Isolation Table
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Model 2000
$48,000.00Add to cartModel 2000 – Flood or Optical Edge Exposure System
- Handles wafer sizes up to 8 inches
- Windows based graphic user interface
- Cassette-to-cassette robotic handling
- Stores and logs process data
- Remote diagnostics feature
- High efficiency automated production system available with near, mid, and deep UV exposure
- Highly stable and precise Intensity Controlling Power Supply
- Optional UV LED upgrade
- Optional SECS/GEM upgrade
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Model 2012
$56,700.00Add to cartModel 2012 – 300mm Optical Edge or Flood Exposure System
• Handles 200 or 300mm wafers (8” -12”)
• Has automated foup loading or cassette to cassette handling
• Up to 8kw Collimated Beam Light Source
• Bar code reader and remote diagnostic
• Semi safety compliant
• Windows graphic user interface
• Remote diagnostics -
Model 212
$5,600.00Add to cartModel 212 – Tabletop Mask Aligner for substrates up to 300mm
- Designed for substrates up to 12” (300 x300 mm)
- Precision alignment
- Low cost R&D tool for large area substrates
- Used for pkg, displays and 300mm wafers
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Model 30
$7,800.00Add to cartModel 30 – UV Collimated Lightsource
Standalone or integrated into any mask aligner or exposure system• Available with near, mid, or deep UV- Mercury Arc and Mercury Xenon lamps
- Highly uniform beam at exposure plain
- Low collimation half angle
- Power up to 12.5 kw
- Pictured with optional stand
- Optional Single Level Tooling Module
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Model 32
$7,900.00Add to cartModel 32 – UV LED Collimated Lightsource
For demanding applications. Standalone or integrated intoan OAI lithography system
- Beam size 4” to 12”
- Wavelengths available: 365nm, 405nm, and 436nm
- Long life, low cost, energy efficient
- Optional single level and multilevel tooling modules
- Matches Model 30 in collimation and functionality
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Model 6000
$55,000.00Add to cartModel 6000 – Fully Automated Mask Aligner for High Volume Production
- Flexibility to handle wafer sizes 4” (100mm) to 12” (300mm)
- Highly optimized yields (200 wph in 1st mask mode)
- Cognix Vision Pro with customized software
- Automatic Wedge Effect Leveling
- Unlimited recipe storage
- Superb process repeatability
- Cluster tool integration
- Front and backside alignment
- Accurate top to bottom auto alignment
- Optional UV LED upgrade
- Optional SECS/GEM Interface upgrade
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Model 6000A
$67,350.00Add to cartModel 6000A-MA Integrated Production Systems- Mask Aligner with Mask Changer
- Includes all the advanced features of the Model 6000
- Reads and verifies the right mask for process stored in the Model 6000 recipes
- Remote diagnosis feature
- Improves thruput in lithography processing
- Prints multiple structures on the same level of a biochip
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Model 6020
$56,000.00Add to cartModel 6020 – Large Substrate ExposureSystem for RDL Panel Level PKG or Glass Panels
- 1st level exposure prints mask on substrates
- Optional Flood Exposure
- Substrate size 20” x20” with 24”x24” mask inserts
- Lamp power 8kw
- Stand alone system or fully integrated into customer’s line
- Available with robotic handling
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Model 800E
$87,990.00Add to cartModel 800E – Semi-Automated Mask Aligner for Front or Backside Mask Alignment
- 3-point automatic wafer leveling
- Windows 10 operating system with unlimited recipe storage
- Remote diagnostics
- Motorized joy stick: allows fast mode to target and precise mode for precision alignment
- One touch from standard view to wide angle view with
- no resolution loss
- IR lamp kit available
- Optional UV LED upgrade
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OAI 308 UV Meter
$3,500.00Add to cartMeter:
• RoHS2 and CE Compliant
• Detachable single or dual wavelength probes
• Auto ranging, digital display
• Light intensity measured in milliwatts/cm2
• Accuracy is traceable to NIST
• High speed port available for data logging
• Optional data logging software -
OAI 656 UV Meter
$3,500.00Add to cartMeter:
• Use with Contact/Proximity Aligners
• Extremely accurate and reliable
• Easily download measurements
• Range of up to 2,000 mW/cm2
• Memory up to 400 measurements
• ROHS2 and CE compliantProbes:
Probe wavelengths (nm)
220, 248, 254, 260, 310, 325, 365, 380, 400, 420, 436 and 540
Multi-layer absorption
dielectric filters -
OAI 659 UV Meter
$3,500.00Add to cartMeter:
Can be used with any Wafer Stepper
• Extremely accurate and reliable
• Perfect for High Intensity Wafer Steppers
• Easily download measurements
• Range of up to 7,500mW/cm2
• Memory up to 400 measurements
• ROHS2 and CE compliantProbes
• Designed for each individual stepper to fit on the stage of the stepper
• Probe wavelengths (nm) 365, 400, 420, 436
• Multi-layer absorption dielectric filters
• Interchangeable with any OAI Model 659 Meter -
OAI UV Meters Calibration
$1,800.00Add to cartCalibration of different types of OAI Meters, such as 308 Meter, 306 Meter, 358 meter, 459 Meter, etc.
